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Nanometer-accurate distance measurement in ultra-high vacuum

Nanometergenaue Abstandsmessung im Ultrahochvakuum

The innovative white light interferometers in the Micro-Epsilon interferoMETER series provide absolute, non-contact distance measurements with maximum precision. With the new IMP DS35/VAC, Micro-Epsilon is expanding its sensor portfolio with a model specifically designed for vacuum environments down to the ultra-high vacuum range. The sensor combines a large offset distance of approximately 35 mm with a resolution of less than 1 nm, making it particularly suitable for demanding measurement tasks in which accuracy, process stability, and ease of integration are crucial.


Large offset distance for new applications
The IMP DS35/VAC offers a measuring range of 2.1 mm with a measuring range start of approximately 35 mm. This enables precise distance measurements from a safe distance, for example for position monitoring in glass wafer production or for measurements on coated wafers. The large offset distance also facilitates applications at low or difficult-to-access measuring points. With a light spot diameter of just 15 µm, even small structures can be detected reliably, while the measuring angle of ±1° supports stable measurement results in demanding installation situations.


High precision combined with powerful controllers
The IMP DS35/VAC features a robust stainless steel housing and is designed for use in vacuum environments down to UHV. The new sensor is available for the IMS5400 and IMS5400MP controllers, enabling resolutions of less than 1 nm and linearities of less than ±50 nm. This makes the system suitable for high-precision distance measurements in modern production and inspection processes. With the IMS5400MP controller, multi-peak distance measurements can also be performed on up to 13 layers. This opens up additional possibilities for analyzing transparent, coated, or multilayer materials.